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Báo cáo hóa học: " An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate"

Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate | Nanoscale Res Lett 2010 5 1570-1577 DOI 10.1007 s11671-010-9678-y NANO EXPRESS An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate Seong-Je Park Soon-Won Lee Ki-Joong Lee Ji-Hye Lee Ki-Don Kim Jun-Ho Jeong Jun-Hyuk Choi Received 29 March 2010 Accepted 29 June 2010 Published online 14 July 2010 The Author s 2010. This article is published with open access at Springerlink.com Abstract An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles which grew by selfassembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50-90 nm and 40-65 respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17 of the reflection of a bare silicon wafer in the visible range. Keywords Antireflective Nanosilver Nanostructure Nanoislands Colloidal lithography Introduction The demand for an effective fabrication method for a large-area nanostructure array has recently stimulated increased interest and research activities in the fields of optics and optoelectronics including photovoltaic cells light-emitting devices and photo-detectors. Two-dimensional arrays of nanostructures have been reported to enable modulation of S.-J. Park S.-W. Lee K.-J. Lee J.-H. Lee K.-D. Kim J.-H. Jeong J.-H. Choi Department of Nanomechanical System Korea Institute of Machinery and Materials 171 Jang-dong Yuseung-gu Daejeon Republic of Korea e-mail junhyuk@kimm.re.kr both the energy and the path of photons to increase .