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Nanoscale Phenomena Basic Science to Device Applications

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The Third InternationalWorkshop of the Croucher Advanced Study Institute (ASI) on Nano Science and Technology: from Basic Science to Device Applications, was held at Hong Kong University of Science and Technology from 8 January to 12 January 2007. The first and second workshops took place in January 1999, and January 2002, respectively. Collected in this volume are 20 articles, 16 from invited talks and four from contributed presentations. The speakers are from the United States, Europe, Japan, Korea, Chinese Mainland, Taiwan, and Hong Kong. During the workshop, the vivid presentations captured the audience’s attention not only with the great potential of nanotechnology, but also brought out the relevant underlying.