Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 7

Tham khảo tài liệu 'nanotechnology and nanoelectronics - materials, devices, measurement techniques part 7', kỹ thuật - công nghệ, cơ khí - chế tạo máy phục vụ nhu cầu học tập, nghiên cứu và làm việc hiệu quả | Fabrication of Nanoparticles 111 Fig. Spray gun for thermal high-speed spraying of oxygen powder fuel 107 drives particles of a nanopowder contained in the pistol through a nozzle onto the surface which is to be covered. An example of a spray gun is shown in Fig. . Atom Optics An atom beam which is produced by heating up a material in a crucible is assumed. The beam is bundled by one or more apertures and steered onto the substrate Fig. . In the next step the beam is subjected to the dipole forces of a standing wave which is produced by a laser beam Fig. . The atoms will devi- Fig. Manufacture of an atom beam 108 Fig. Lens arrangement with a standing wave 108 112 5 Nanoparticles ate to the nodes of the standing wave where they are subjected to the smallest forces. The ideas of Fig. and can be combined for the assembly of atomic bundling Fig. . A lattice pattern reflecting the wavelength of the laser is produced Fig. . A second standing wave may be used perpendicularly to the first and to the direction of the beam. This gives rise to a two-dimensional pattern of deposited atoms Fig. . Sol Gels A sol hydrosol is a colloidal dispersion in liquid. A gel is a jelly-like substance formed by coagulation of a sol into a gel. The best known example of a sol gel process is probably the production of SiO2. A catalyst acid or base is added to a solution of tetramethoxysilane TMOS water and methanol. Hydrolysis of the Si-OMe Me methyl bonds Fig. Assembly for atom focusing in a standing wave 108 Fig. AFM images of a one-dimensional lattice with 212 nm pitch and 38 nm line width formed by laser-focused atom deposition of chromium 109 Fabrication of Nanoparticles 113 Fig. AFM images of a two-dimensional lattice formed by laser-focused Cr deposition 110 leads to the formation of Si-OH groups Si OMe 4 4H2O Si OH 4 4MeOH Further dehydration reduces the Si OH 4 to SiO2 gel. If hydrolysis and condensation

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