Tuyển tập các báo cáo nghiên cứu về hóa học được đăng trên tạp chí hóa hoc quốc tế đề tài : A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate | Nanoscale Research Letters SpringerOpen0 This Provisional PDF corresponds to the article as it appeared upon acceptance. Fully formatted PDF and full text HTML versions will be made available soon. A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate Nanoscale Research Letters 2012 7 62 doi 1556-276X-7-62 Sang-Jin Cho bluescreen@ Jin-Hyo Boo jhboo@ ISSN 1556-276X Article type Nano Express Submission date 8 September 2011 Acceptance date 5 January 2012 Publication date 5 January 2012 Article URL http content 7 1 62 This peer-reviewed article was published immediately upon acceptance. It can be downloaded printed and distributed freely for any purposes see copyright notice below . Articles in Nanoscale Research Letters are listed in PubMed and archived at PubMed Central. For information about publishing your research in Nanoscale Research Letters go to http authors instructions For information about other SpringerOpen publications go to http 2012 Cho and Boo licensee Springer. This is an open access article distributed under the terms of the Creative Commons Attribution License http licenses by which permits unrestricted use distribution and reproduction in any medium provided the original work is properly cited. A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate Sang-Jin Cho1 and Jin-Hyo Boo 1 department of Chemistry and Institute of Basic Science Sungkyunkwan University Suwon 440-746 South Korea Corresponding author jhboo@ Email addresses SJC bluescreen@ JHB jhboo@ Abstract Nitrogen-doped thiophene plasma polymer N-ThioPP thin films were deposited by radio frequency MHz plasma-enhanced chemical vapor deposition method. Thiophene was used as organic precursor carbon source with hydrogen gas as the precursor bubbler gas. Additionally .
