Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe | Jiang et al. Nanoscale Research Letters 2011 6 518 http content 6 1 518 o Nanoscale Research Letters a SpringerOpen Journal NANO EXPRESS Open Access Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon DLC -coated Si probe Xiaohong Jiang 1 Guoyun Wu1 Jingfang Zhou2 Shujie Wang1 Ampere A Tseng3 and Zuliang Du1 Abstract Atomic force microscope AFM equipped with diamond-like carbon DLC -coated Si probe has been used for scratch nanolithography on Si surfaces. The effect of scratch direction applied tip force scratch speed and number of scratches on the size of the scratched geometry has been investigated. The size of the groove differs with scratch direction which increases with the applied tip force and number of scratches but decreases slightly with scratch speed. Complex nanostructures of arrays of parallel lines and square arrays are further fabricated uniformly and precisely on Si substrates at relatively high scratch speed. DLC-coated Si probe has the potential to be an alternative in AFM-based scratch nanofabrication on hard surfaces. Introduction Nanolithography is crucial to realize a size below 100 nm for nanoelectronic devices and high density recording systems 1 2 . Apart from conventional expensive optical and electron beam lithography 1 2 scanning probe microscopy SPM especially scanning tunneling microcopy STM and atomic force microscopy AFM -based nanofabrication technique have been intensively studied. To date several SPM-based nanolithography techniques have been developed including local oxidation of the surfaces of silicon and metals 3-5 dip-pen method 6 7 thermal-mechanical writing 2 8 and mechanical electrochemical modification of a material s surface 9-11 . In recent years although the uncertainty drift hysteresis creep for AFM will limit its application in nanostructure fabrication at large scale AFM-based scratch nanolithography has emerged as a promising technique for .
