Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: Fabrication of flexible UV nanoimprint mold with fluorinated polymer-coated PET film | Shin et al. Nanoscale Research Letters 2011 6 458 http content 6 1 458 o Nanoscale Research Letters a SpringerOpen Journal NANO EXPRESS Open Access Fabrication of flexible UV nanoimprint mold with fluorinated polymer-coated PET film Ju-Hyeon Shin1 Seong-Hwan Lee1 Kyeong-Jae Byeon1 Kang-Soo Han1 Heon Lee1 and Kentaro Tsunozaki2 Abstract UV curing nanoimprint lithography is one of the most promising techniques for the fabrication of micro- to nanosized patterns on various substrates with high throughput and a low production cost. The UV nanoimprint process requires a transparent template with micro- to nano-sized surface protrusions having a low surface energy and good flexibility. Therefore the development of low-cost transparent and flexible templates is essential. In this study a flexible polyethylene terephthalate PET film coated with a fluorinated polymer material was used as an imprinting mold. Micro- and nano-sized surface protrusion patterns were formed on the fluorinated polymer layer by the hot embossing process from a Si master template. Then the replicated pattern of the fluorinated polymer coated on the flexible PET film was used as a template for the UV nanoimprint process without any anti-stiction coating process. In this way the micro- to nano-sized patterns of the original master Si template were replicated on various substrates including a flat Si substrate and curved acryl substrate with high fidelity using UV nanoimprint lithography. Introduction In order to form micro- to nano-sized patterns various lithographic technologies have been used such as DUV photolithography 1 e-beam lithography 2 3 X-ray lithography 4 5 laser holographic lithography 6 nanosphere lithography 7 scanning probe microscopy lithography 8 and so on. Except for DUV photolithography these conventional lithography technologies require either a complicated patterning system with a high process cost or offer limited throughput and thus are not suitable for
