In this report, the ZnO nanostructure films have been deposited by ultrasonic spray pyrolysis technique (USP) on fluorine doped tinoxide (FTO) substrate using zinc acetate and aqueous 2-propanol as reactants. The effects of solution spray rate on structural, morphological and optical properties of ZnO nanostructure films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis measurements. ZnO films were crystallized in the hexagonal wurtzite phase and preferential orientation changed with changing of spray rate. | Communications in Physics, Vol. 24, No. 3S1 (2014), pp. 108-112 DOI: INFLUENCE OF SPRAY RATE ON STRUCTURAL AND OPTICAL PROPERTIES OF SPRAYED ZnO FILMS LUU THI LAN ANH, LUONG HUU BAC, PHAM PHI HUNG, NGUYEN DUC HIEU, MATEUS MANUEL NETO, VO THACH SON, Hanoi University of Science and Technology TRAN THANH THAI Quy Nhon University E-mail: phamthetansp@ Received 20 June 2014 Accepted for publication 20 August 2014 Abstract. In this report, the ZnO nanostructure films have been deposited by ultrasonic spray pyrolysis technique (USP) on fluorine doped tinoxide (FTO) substrate using zinc acetate and aqueous 2-propanol as reactants. The effects of solution spray rate on structural, morphological and optical properties of ZnO nanostructure films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis measurements. ZnO films were crystallized in the hexagonal wurtzite phase and preferential orientation changed with changing of spray rate. Grain size and roughness of films depended on spray rate. Increasing spray rate made the films grown with bigger grain size and higher roughness. Band gap energy was determined from the UV-Vis. Its value was found to be of eV and was almost independent on the spray rate. Keywords: ZnO, Ultrasonic Spray Pyrolysis, thin film, Solution Spray Rate. I. INTRODUCTION Zinc oxide (ZnO) has attracted much attention recently for potential applications due to its wide band gap (∼ eV) and large exciton binding energy (∼60 meV) at room temperature [1]. ZnO is one of the typical II-VI semiconductor materials which have various applications such as light-emitting diodes, electroluminescent devices, electrooptic modulators and window layers in photovoltaic cells and gas sensors [2–9]. ZnO thin film have been fabricated by various methods such as electrochemical deposition [10], sol-gel method [11], chemical bath deposition [12], RF magnetron sputtering [13], and chemical spray .
