Fluorination and hydrogenation are known as two methods for enhancing crystalline structural and electrical properties of ZnO material. The ZnO thin films normally require a low resistivity and a high transmittance for using as high-performance transparent electrodes in optoelectronic applications. In this study, we report successful preparation of fluorinated and hydrogenated ZnO thin films (FZO and HFZO) by using . magnetron sputtering technique. The hydrogenation was carried out by depositing the films in hydrogen plasma atmosphere, while a highly-sintered body of ZnO and ZnF2 compound was employed as a sputtering target for the fluorination. | Study on fluorination and hydrogenation in transparent conducting zinc oxide thin films
