In this paper, we propose a procedure to reduce the thickness of the SU-8 3050 thin film. By mixing the SU-8 3050 with Cyclopentanone (CP) with different volume ratios, we can control viscosity of the mixture. Therefore, the thickness of the fabricated photoresist layer at 2000 rpm spincoating can be from 540 nm to 5330 nm. The mixing procedures of SU-8 fabrication have been optimized in order to enhance the unity of the thin layer photoresist. Some other fabrication factors are also investigated. |
