Electrodeposition kinetics of Co thin film were investigated and magnetic coercivity of the deposited films were studied using potentiostatic technique and magnetic hyteresis loop measurements. Results showed that the nucleation mechanism of the electrodeposition process changed from instantaneous mode to progressive mode when potential was changed from – V to – V. The magnetic coercivity Hc increases with deposition time and the film with Hc < 15 Oe can be obtained with deposition time t < 5 s.
