Tham khảo tài liệu 'coatings technology handbook episode 1 part 9', kỹ thuật - công nghệ, cơ khí - chế tạo máy phục vụ nhu cầu học tập, nghiên cứu và làm việc hiệu quả | 30-10 Coatings Technology Handbook Third Edition Magnetic Some high-performance magnetic data storage media are deposited via sputtering. Cobalt alloys such as cobalt-chromium and to a lesser extent nickel iron and samarium alloys are typically used. Optical Thin metal and dielectric coatings are used to construct mirrors antireflection coatings light valves laser optics and lens coatings and to provide architectural energy control and optical data storage. Mechanical Hard coatings such as titanium carbide nitride and carbon produce wear-resistant coatings for cutting tools. Molybdenum sulfide serves as a solid lubricant. Chemical Thin film coatings can be used to provide high-temperature environmental corrosion resistance for aerospace and engine parts catalyst surfaces gas barrier layers and lightweight battery components. Decorative Titanium nitride is deposited on watch bands and jewelry as a hard gold-colored coating. Metals are deposited for weight reduction in automotive and decorative graphics applications. Additional Resources The following professional societies include sections dealing with sputtered coatings American Vacuum Society offers short courses in sputtering and coatings Society of Vacuum Coaters Electrochemical Society and Materials Research Society. Journals that cover developments in sputtered coatings include Journal of Vacuum Science and Technology Thin Solid Films Journal of Applied Physics Vacuum Progress in Surface Science and the Journal of the Electrochemical Society. Bibliography Bunshah R. F. et al. Deposition Technologies for Films and Coatings. Park Ridge NJ Noyes Publications 1982. Chapman B. Glow Discharge Processes Sputtering and Plasma Etching. New York Wiley 1980. Coutts T. J. Active and Passive Thin Film Devices. New York Academic Press 1978. Maissel L. I. and R. Glang Handbook of Thin Film Technology. New York McGraw-Hill 1970. Vossen J. L. and W. Kern Thin Film Processes. New York .
