In this study, the TiO2 passive layer was formed on a pure titanium substrate by simple oxidation in an aqueous solution of H2O2 35 wt.%. In order to determine the appropriate time for the oxidation of the pure titanium substrate, the corrosion rate of the metal in the solution of H2O2 was investigated. The electrochemical behaviour of the TiO2 passive layer on the Ti substrate was investigated in Hank’s solution at °C. |